蔡坤諭副教授的個人資料 - Profile of Kuen-Yu Tsai

蔡坤諭 Kuen-Yu Tsai

國立臺灣大學電機工程學系 副教授
Associate Professor, Department of Electrical Engineering, National Taiwan University

主要研究領域:

奈米微影製像製程、設備與軟體技術，奈米積體電路可製造性與抗變異性設計，奈米尺度偵測與控制系統，高精密光機電整合，多準則強健最佳控制，系統識別，凸最佳化及其工程應用

Major Research Areas:

Nanolithography/nanopatterning process, equipment, and software technologies; Nanoscale integrated-circuit design for manufacturability and invariability; Nanoscale detection and control systems; High-precision optomechatronics; Multiobjective-robust-optimal control; System identification; Convex optimization and its engineering applications

研究領域摘要:

Research Summary:

Dr. Tsai's main research theme is the design and application of advanced control, simulation, signal processing, optimization, and machine learning techniques to solve nanolithography and general nanotechnology related problems, with a current focus on the design and fabrication techniques of exploratory nanoscale integrated circuits at the IRDS 10 nm half-pitch node (aka "2 nm node") and beyond. More recently he has increased aerospace-related research activities. He has also conducted research on control system design automation, automotive and aerospace electronics,  consumer electronics, and biomedical equipment design. His research group at the Nanoscale Design and Fabrication Systems Lab (NDFSL), Particle Beam Precision Patterning and Imaging Lab (PBPPIL), and High-Performance Servo Systems Lab (HPSSL) has been studying topics including, e.g.,

(1) Nanolithography processes and equipment: Next-generation lithography (NGL) based on multiple-charged-particle-beam-direct-write (MCPBDW), extreme ultraviolet (EUV) light, and directed self-assembly (DSA); Ion beam imaging and patterning. (2) Nanolithography software: Lithography/etching simulation, model calibration, and resolution enhancement techniques (RETs); Design for manufacturability (DFM); Charged-particle optics design optimization. (3) Nanolithography process and equipment control: Advanced process control (APC), advanced equipment control (AEC), and fault detection/classification (FDC); High-accuracy alignment and overlay algorithms; Optimal lens adjustment. (4) Circuit design automation by control and optimization techniques: Optimal design of sensor/actuator/power/computation circuits with control system perspectives. Automatic circuit/layout generation and optimization. Design for radiation hardening. (5) Sensor/actuator array systems, signal processing, and real-time control: Electron-beam position monitor system based on MEMS and sensor fusion technologies. Mixed-signal circuit design for laser interferometers. High-performance motion systems, e.g. micro laser scanning mirrors. Laser speckle reduction. ADAS sensor analysis and robustness evaluation. (6) Automotive and aerospace electronic systems: Permanent magnet synchronous motor control system analysis and design for mild hybrid vehicles. Active/semi-active suspension systems. (7) Design and control of UAV systems: Optimal design and control of electrical VTOL (eVTOL) aircraft. Control and optimization in advanced air mobility (AAM) systems.

Dr. Tsai is open to establishing new research topics based on student interests and industry demands.

NTU EE Research Divisions Automatic Control, Electronic Design Automation

Teaching Control Systems (2019 Spr.), Digital Control Systems (2020 Spr.), System Identification (2020 Aut.), Nonlinear/Convex Optimization (2019 Aut.), VLSI Design for Manufacturability

Talks

 "Introduction to Lithography for Nanometer VLSI Manufacturing" (2006/12/21 at NTHU CS dept. and 2007/03/09 at EDA Forum in Taiwan)

"NGL Research Activities at NTU" (2006/12/12 EVU Workshop at NSRRC, Taiwan)

"From Control to Nanofabrication -- A System Engineer's Vision" (2004/03/24 at NTU EE dept.)

Favorite Quotes

"There's plenty of room at the bottom." – Richard P. Feynman

"No exponential is forever: but "Forever" can be delayed!" – Gordon E. Moore

"The road to hell is paved with good intentions."

Article Links

How William Shockley's Robot Dream Helped Launch Silicon Valley, IEEE Spectrum, 2013

Trailblazers in Solid-State Electronics, IEEE Industrial Electronics Magazine, IEEE 5(4), pp. 46-47, 2011

Group Staff

Ms. Yi-Ru Chen, Adminstrative Research Assistant. diochen@ntu.edu.tw +886-2-33669638

Mr. Jia-Syun Cai, Technology Research Specialist. d11943003@ntu.edu.tw +886-2-33663704

Funding info. for prospective graduate students Full-time graduate students are adequately supported regardless of research topic(s) chosen.

Positions One Postdoctoral Researcher position is currently open.

Photo of Kuen-Yu Tsai

代表性著作 Selected Publication

  1. Chun-Hung Liu, Philip C. W. Ng, Yu-Tian Shen, Sheng-Wei Chien, and Kuen-Yu Tsai*, “Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography,” Journal of Vacuum Science & Technology B (Top 20 Most Downloaded Articles, Feb. 2013), Volume 31, Issue 2, 021605, Feb. 2013
  2. Hoi-Tou Ng, Yu-Tian Shen, Sheng-Yung Chen, Chun-Hung Liu, Philip C. W. Ng, and Kuen-Yu Tsai*, “New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints,” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 11, Number 3, 033007, Sept. 2012
  3. Sheng-Yung Chen, Hoi-Tou Ng, Shiau-Yi Ma, Hsing-Hong Chen, Chun-Hung Liu, and Kuen-Yu Tsai*, “Lithography-patterning-fidelity-aware electron-optical system design optimization,” Journal of Vacuum Science and Technology B, Volume 29, Number 6, 06FD04, Dec. 2011
  4. Philip C. W. Ng, Sheng-Wei Chien, Bo-Sen Chang, Kuen-Yu Tsai*, Yi-Chang Lu, Jia-Han Li, and Alek C. Chen, “Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography,” Japanese Journal of Applied Physics, Volume 50, Number 6 (Special issue: MNC 2010), 06GB07, Jun. 2011
  5. Philip C. W. Ng, Kuen-Yu Tsai*, Yen-Min Lee, Fu-Min Wang, Jia-Han Li, and Alek C. Chen, “Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects,” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 10, Issue 1, 013004, Mar. 2011
  6. Kuen-Yu Tsai*, Sheng-Yung Chen, Ting-Han Pei, and Jia-Han Li, “Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors,” Japanese Journal of Applied Physics, Volume 49, Number 6 (Special Issue: MNC 2009), 06GD08, Jun. 2010
  7. Kuen-Yu Tsai*, Wei-Jhih Hsieh, Yuan-Ching Lu, Bo-Sen Chang, Sheng-Wei Chien, Yi-Chang Lu, “A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects,” ASP-DAC 2010, The 15th Asia and South Pacific Design Automation Conference, 651-656, Taipei, Taiwan, Jan. 2010
  8. Kuen-Yu Tsai*, Meng-Fu You, Yi-Chang Lu, and Philip C. W. Ng, “A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects,” ICCAD 2008, IEEE/ACM International Conference on Computer-Aided Design, 286-291, San Jose, California, USA, Nov. 2008
  9. Kuen-Yu Tsai*; Eric M. Gullikson, Patrick Kearney, and Alan R. Stivers, “On the sensitivity improvement and cross-correlation methodology for confocal EUV mask blank defect inspection tool fleet,” 25th Annual BACUS Symposium on Photomask Technology -- Proc. of SPIE Vol. 5992, 599240, Monterey, California, USA, Oct. 2005
  10. Kuen-Yu Tsai* and Haitham A. Hindi, “DQIT: /spl mu/-synthesis without D-scale fitting,” Automatic Control, IEEE Transactions on, Volume 49, Issue 11, 2028-2032, Nov. 2004